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Excimer ions as possible candidates for VUV and XUV lasersSAUERBREY, R; LANGHOFF, H.IEEE journal of quantum electronics. 1985, Vol 21, Num 3, pp 179-181, issn 0018-9197Article

A practical solution to the critical problem of 193 nm reticle hazeHALBMAIER, Dave; OHYASHIKI, Yasushi; KISHKOVICH, Oleg et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282G.1-70282G.7, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

A short period undulator for MAXAHOLA, H; MEINANDER, T.Review of scientific instruments. 1992, Vol 63, Num 1, pp 372-375, issn 0034-6748, 2AConference Paper

Surface discharges as intense photon sources in the extreme ultravioletWOODWORTH, J. R; MCKAY, P. F.Journal of applied physics. 1985, Vol 58, Num 9, pp 3364-3367, issn 0021-8979Article

Interpretation of the satellite spectrum that follows ionization in the 5s and 5p shells of Xe at low photon energyHANSEN, J. E; PERSSON, W.Physical review. A, General physics. 1984, Vol 30, Num 3, pp 1565-1567, issn 0556-2791Article

Characterization of low-order aberrations in the SEMATECH Albany MET toolNAULLEAU, Patrick; WATERMAN, Justin; DEAN, Kim et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65172Q.1-65172Q.9, issn 0277-786X, isbn 978-0-8194-6636-5Conference Paper

Single-step lift-off process using chlorobenzene soak on AZ4000 resistsFATHIMULLA, A.Journal of vacuum science and technology. B. Microelectronics processing and phenomena. 1985, Vol 3, Num 1, pp 25-27, issn 0734-211XArticle

Observations of the high latitude far ultraviolet background in the 1040-1080 Å bandBIXLER, J; BOWYER, S; GREWING, M et al.Astronomy and astrophysics (Berlin. Print). 1984, Vol 141, Num 2, pp 422-424, issn 0004-6361Article

Environmental data from the Engineering Test StandKLEBANOFF, L. E; GRUNOW, P. A; GRAHAM, S et al.SPIE proceedings series. 2002, pp 310-315, isbn 0-8194-4434-0, 2VolConference Paper

The MEEF shall inherit the earthCONLEY, Will; GARZA, Cesar; DUSA, Mircea et al.SPIE proceedings series. 2001, pp 251-258, isbn 0-8194-4032-9, 2VolConference Paper

Transient decreases of Earth's far-ultraviolet dayglowFRANK, L. A; SIGWARTH, J. B.Geophysical research letters. 1997, Vol 24, Num 19, pp 2423-2426, issn 0094-8276Article

Spectral reflectance measurements using a precision multiple reflectometer in the UV and VUV rangeDA-KUI ZHUANG; TIAN-LI YANG.Applied optics. 1989, Vol 28, Num 23, pp 5024-5028, issn 0003-6935Article

Collisionally excited XUV lasersPAPANYAN, V. O; MARTIROSYAN, A. E; TITTEL, F. K et al.IEEE journal of quantum electronics. 1983, Vol 19, Num 12, pp 1835-1840, issn 0018-9197Article

Impact of EUV light scatter on CD control as a result of mask density changesKRAUTSCHIK, Christof; ITO, Masaaki; NISHIYAMA, Iwao et al.SPIE proceedings series. 2002, pp 289-301, isbn 0-8194-4434-0, 2VolConference Paper

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²P photoionization cross section of Sb IMAZZONI, M.Physics letters. A. 1983, Vol 97, Num 9, pp 381-383, issn 0375-9601Article

ON THE FAR ULTRAVIOLET FLUX DISTRIBUTION OF THE ORION NEBULACARRUTHERS GR; HECKATHORN HM.1981; ASTROPHYS. LETT.; ISSN 0004-6388; USA; DA. 1981; VOL. 22; NO 1; PP. 135-141; BIBL. 16 REF.Article

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EUV Source TechnologyBAKSHI, Vivek.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 103-131, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 29 p.Book Chapter

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Fundamentals of EUVL ScannersOTA, Kazuya.EUV lithography. SPIE Press Monograph. 2009, Vol 178, pp 493-513, isbn 978-0-8194-6964-9 978-0-4704-7155-5, 1Vol, 21 p.Book Chapter

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